[16a-2D-5~12] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

[16a-2D-7] Evaluation of Cobalt Silicide formation process by Raman spectroscopy

〇(M1)Kazuya Yamamura¹, Hiroshi Nishigaki¹, Noriyuki Hasuike¹, Hiroshi Harima¹, Woo Sik Yoo² (1.Kyoto Inst. Tech., 2.Wafer Masters Inc.)

Keywords:Cobalt silicide,Raman spectroscopy