9:45 AM - 10:00 AM
[16a-2Q-4] Influences of Pulse Discharge on Formation of SiO:CH Particles by CCP-CVD
Keywords:SiO:CH,particles,pulsed PECVD
We investigated the formation of SiO:CH particles polymerized in plasma during a pulsed RF-PECVD process with organosilicon reactants. It was found that the polymerization occurs when the duty ratio is higher than a specific value, and that there is an inverse correlation between the surface density and the average size of the deposited particles.