[16a-2R-1~11] 13.2 Exploratory Materials, Physical Properties, Devices

△ [16a-2R-11] Preparation of Ca-Mg-Si Films by Sputtering Method and Their Properties

〇Mutsuo Uehara¹, Mao Kurokawa¹, Kensuke Akiyama^1,2, Masaaki Matsushima¹, HIroshi Uchida³, Yoshisato Kimura¹, Hiroshi Funakubo¹ (1.Tokyo Tech., 2.Kanagawa Industrial Technology Center, 3.Sophia Univ.)

Keywords:Thermoelectric materials,Silicide,Sputtering method