The 76th JSAP Autumn Meeting, 2015

Presentation information

Print

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[16a-4E-9~12] 7.3 Micro/Nano patterning and fabrication

Wed. Sep 16, 2015 11:15 AM - 12:15 PM 4E (437)

座長:山本 治朗(日立)

11:30 AM - 11:45 AM

[16a-4E-10] Electron beam lithography using NEB-22 for 50 nm-line and space pattern fabrication

〇Makoto Okada1, Shinji Matsui1 (1.LASTI, Univ. of Hyogo)

Keywords:electron beam lithography,negative tone resist

We carried out electron beam lithography using NEB-22 for 50 nm-line and space pattern fabrication. The 40 nm-line and 70 nm-space pattern was clearly fabricated.