Oral presentation

[16a-4E-9~12] 7.3 Micro/Nano patterning and fabrication

Wed. Sep 16, 2015 11:15 AM - 12:15 PM 4E (437)

座長:山本治朗(日立)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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11:15 AM - 11:30 AM

△ [16a-4E-9] Development of Transmission Grating of EUV Interference Lithography for12.5 nm HP EUV Resist Evaluation

〇(M1)Yuki Fukuda¹, Tsubasa Fukui¹, Hirohito Tannino¹, Tetsuo Harada¹, Takeo Watanabe¹ (1.Univ. of Hyogo)

11:30 AM - 11:45 AM

[16a-4E-10] Electron beam lithography using NEB-22 for 50 nm-line and space pattern fabrication

〇Makoto Okada¹, Shinji Matsui¹ (1.LASTI, Univ. of Hyogo)

11:45 AM - 12:00 PM

[16a-4E-11] Exposure Characteristics of New Modacrylic Electron Beam Polymer Resist

〇RYOICHI HOSHINO¹, ATSUSHI KAWATA¹, MASASHI KUNITAKE², SHUNSUKE OCHIAI³, TOMOHIRO TAKAYAMA³, YUKIKO KISHIMURA³, HIRONORI ASADA³ (1.Gluon Lab, 2.Kumamoto Univ., 3.Yamaguchi Univ.)

12:00 PM - 12:15 PM

[16a-4E-12] Rapid Thermally Directed Self-Assembly of Amphiphilic Liquid-Crystalline Diblock Copolymer into Quasi-Long-Range-Ordered 2D Vertical Cylinder Arrays

〇Toru Yamaguchi¹, Motonori Komura³, Keiji Nagai², Akira Fujiwara¹, Hiroshi Yamaguchi¹, Tomokazu Iyoda² (1.NTT BRL, 2.Tokyo Inst. Tech., 3.NIT, Numazu College)

Oral presentation

[16p-4E-1~11] 7.3 Micro/Nano patterning and fabrication

Wed. Sep 16, 2015 1:45 PM - 4:45 PM 4E (437)

座長:山口徹(ＮＴＴ),岡田真(兵庫県立大),柳下崇(首都大)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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1:45 PM - 2:00 PM

[16p-4E-1] High precisely wavelength measuring technique for next generation multiple-patterning lithography

〇Hiroshi Furusato¹, Masato Moriya¹, Takahito Kumazaki¹, Hiroaki Tsushima¹, Takeshi Ohta¹, Akihiko Kurosu¹, Satoshi Tanaka¹, Takashi Matsunaga¹, Hakaru Mizoguchi¹ (1.GPI)

2:00 PM - 2:15 PM

[16p-4E-2] New Technology for Fabricating an Optical Fiber Matrix Used for Printing Fine Code Marks

〇jun watanabe¹, jun-ya iwasaki¹, toshiyuki horiuchi¹ (1.Tokyo Denki Univ.)

2:15 PM - 2:30 PM

[16p-4E-3] Investigation of Resolution and Homogeneity Degradation in Scan Projection Exposure Using a Gradient-Index Lens Array

〇takanori sato¹, Horiuchi Toshiyuki¹ (1.TokyoDenki Univ.)

2:30 PM - 2:45 PM

[16p-4E-4] Fabrication of Lenticular Lens Patterns Using a Desktop Projection-Exposure System

〇yuhta morizane¹, toshiyuki horiuchi¹ (1.Tokyo Denki Univ.)

2:45 PM - 3:00 PM

△ [16p-4E-5] Photoresist removal using hydrogen radical introducing trace amounts of oxygen gas

〇Masashi Yamamoto¹, Hironobu Umemoto², Keisuke Ohdaira³, Takashi Nishiyama⁴, Hideo Horibe⁴ (1.NIT, Kagawa College, 2.Shizuoka Univ., 3.JAIST, 4.Osaka City Univ.)

3:00 PM - 3:15 PM

[16p-4E-6] Computational study on 3-dimensonal exposure by Built-in lens mask lithographyⅢ

〇Toshiki Tanaka¹, Masaru Sasago¹, Hisao Kikuta¹, Hiroaki Kawata¹, Yoshihiko Hirai¹ (1.Osaka Pref. Univ.)

Break （3:15 PM - 3:30 PM）

3:30 PM - 3:45 PM

△ [16p-4E-7] Transcription of atomic step pattern and surface ultra-flattening on transparent polyimide sheets by thermal nanoimprint process

〇Kodai Shimada¹, Geng Tan¹, Yasuhisa Nozawa¹, Tatsuhiro Urakami², Koji Koyama³, Satoru Kaneko^4,1, Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Inst. of Tech, 2.Mitsui Chemicals, Inc., 3.Namiki Precision Jewel Co.,Ltd., 4.Kanagawa Ind. Tech. Cent.)

3:45 PM - 4:00 PM

△ [16p-4E-8] Influence of heat and pressure conditions and atomically stepped mold patterns on the nanoimprint transcription of atomic step patterns onto polymer surfaces

〇Geng Tan¹, Kodai Shimada¹, Yasuhisa Nozawa¹, Koji Koyama², Satoru Kaneko^3,1, Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Inst. of Tech, 2.Namiki Inc., 3.Kanagawa Ind. Tech)

4:00 PM - 4:15 PM

[16p-4E-9] Fabrication of ordered structures by nanoimprinting using anodic porous alumina

〇KAITO MURAKOSHI¹, Takashi Yanagishita¹, Masuda Hideki¹ (1.Tokyo Metropolitan Univ.)

4:15 PM - 4:30 PM

[16p-4E-10] Double nanoimprint-graphoepitaxy for localized liquid crystalline molecular orientation

〇Makoto Okada¹, Yusuke Taniguchi², Yuichi Haruyama¹, Hiroshi Ono³, Nobuhiro Kawatsuki², Shinji Matsui¹ (1.LASTI, Univ. of Hyogo, 2.Graduate School of Engineering, Univ. of Hyogo, 3.Nagaoka Univ. of Technology)

4:30 PM - 4:45 PM

[16p-4E-11] Study of the Resistance of Antisticking Layers against Repeated UV nanoimprint

〇Shuso Iyoshi¹, Makoto Okada¹, Yuichi Haruyama¹, Shinji Matsui¹ (1.Univ. of Hyogo)

Sessions

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication