[16p-4E-1~11] 7.3 Micro/Nano patterning and fabrication

[16p-4E-6] Computational study on 3-dimensonal exposure by Built-in lens mask lithographyⅢ

〇Toshiki Tanaka¹, Masaru Sasago¹, Hisao Kikuta¹, Hiroaki Kawata¹, Yoshihiko Hirai¹ (1.Osaka Pref. Univ.)

Keywords:photo lithography,3-dimensional fablication,complex amplitude

Novel 3-dimentional photo lithography is proposed. To obtain 3D image, complex amplitudes are superposed for multiple focus planes. To avoid the interference with each other, phase shift is performed. The performance is evaluated by computational lithography works.