[16p-4E-1~11] 7.3 Micro/Nano patterning and fabrication

[16p-4E-1] High precisely wavelength measuring technique for next generation multiple-patterning lithography

〇Hiroshi Furusato¹, Masato Moriya¹, Takahito Kumazaki¹, Hiroaki Tsushima¹, Takeshi Ohta¹, Akihiko Kurosu¹, Satoshi Tanaka¹, Takashi Matsunaga¹, Hakaru Mizoguchi¹ (1.GPI)

Keywords:lithography,ArF laser,wavelength measurement

In semiconductor lithography, light source has to measure and control wavelength high precisely and stably for multiple-patterning refinement. Light source needs to have a wavelength variable function because exposure machine adjusts wavelength to compensate refractive index change caused by the atmospheric pressure. To satisfy these demands we have developed wavelength meter that is able to measure high precisely and extensively wavelength. We will report absolute accuracy and repeatable precision about the wavelength meter.