The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[16p-4E-1~11] 7.3 Micro/Nano patterning and fabrication

Wed. Sep 16, 2015 1:45 PM - 4:45 PM 4E (437)

座長:山口 徹(NTT),岡田 真(兵庫県立大),柳下 崇(首都大)

4:30 PM - 4:45 PM

[16p-4E-11] Study of the Resistance of Antisticking Layers against Repeated UV nanoimprint

〇Shuso Iyoshi1, Makoto Okada1, Yuichi Haruyama1, Shinji Matsui1 (1.Univ. of Hyogo)

Keywords:UV nanoimprint,resinstance of antisticking layer,additive

The study of the resistance of mold Antisticking layer (ASL) was conducted in a way that water contact angles in the mold surface were determined after repeated UV nanoimprint. It was found that the resistance od ASL was largely extended when an additive was used together with a levering agent, which is occasionally added for the enhancement of contact between a resist and a substrate,