The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[16p-4E-1~11] 7.3 Micro/Nano patterning and fabrication

Wed. Sep 16, 2015 1:45 PM - 4:45 PM 4E (437)

座長:山口 徹(NTT),岡田 真(兵庫県立大),柳下 崇(首都大)

4:15 PM - 4:30 PM

[16p-4E-10] Double nanoimprint-graphoepitaxy for localized liquid crystalline molecular orientation

〇Makoto Okada1, Yusuke Taniguchi2, Yuichi Haruyama1, Hiroshi Ono3, Nobuhiro Kawatsuki2, Shinji Matsui1 (1.LASTI, Univ. of Hyogo, 2.Graduate School of Engineering, Univ. of Hyogo, 3.Nagaoka Univ. of Technology)

Keywords:Nanoimprint,Liquid cristal

We call the nanoimprint process for inducing the molecular orientation "nanoimprint-graphoepitaxy". The nanoimprint process can be carried out an imprinted pattern. This means that the molecular orientation may twice occur by double nanoimprint-graphoepitaxy. In this work, to advance molecular orientation technique by nanoimprint-graphoepitaxy, we demonstrated the double nanoimprint-graphoepitaxy for photo-cross-linkable liquid crystalline polymer and evaluated the molecular orientation of the fabricated pattern.