[16p-4E-1~11] 7.3 Micro/Nano patterning and fabrication

△ [16p-4E-8] Influence of heat and pressure conditions and atomically stepped mold patterns on the nanoimprint transcription of atomic step patterns onto polymer surfaces

〇Geng Tan¹, Kodai Shimada¹, Yasuhisa Nozawa¹, Koji Koyama², Satoru Kaneko^3,1, Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Inst. of Tech, 2.Namiki Inc., 3.Kanagawa Ind. Tech)

Keywords:thermal nanoimprinting,Atomic-scale patterning,Patterning of polymer surfaces

Transcription by thermal nanoimprint process has the possibility of fabricating atomic-scale pattern, so the study on progressing high-resolution pattern by this process has attracted much attention. In the previous work, we have reported the fabrication of regular step pattern with about 800 nm separation and 0.3 nm step height on PMMA surfaces. In this study, we investigated the association of the mold's stepped pattern, heat and press conditions and process sequence with the transcription of atomically stepped pattern on polymer surfaces.