[16a-PA2-1~60] 17 Nanocarbon Technology（Poster）

[16a-PA2-38] Large Single Layer Etching of 2D Layered Material using Inward-Plasma

〇Jun Miyawaki¹, Toshitaka Kubo¹, Tetsuo Shimizu¹, Shun'ichiro Shimbori², Satoshi Takahashi², Atsushi Ando¹ (1.AIST, 2.Sanyu Co., Ltd.)

Keywords:2D layered material,plasma etching

We tried to etch the surface of molybdenum disulfide, which is one of possible candidates for the next-generation nanoelectronic devices, in layer-by-layer manner by using inward plasma. Etched surfaces were characterized using scanning tunnel microscope. Many concentric circles were observed with the step height of ~ 0.6 nm which corresponds to the thickness of one layer of MoS₂. The largest width/depth ratio is about 1000, indicating that the etching proceeds in a nearly layer-by-layer manner at the early stage.