The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

13 Semiconductors » 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

[16p-2D-1~14] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

Wed. Sep 16, 2015 1:15 PM - 5:00 PM 2D (212-2)

座長:嵯峨 幸一郎(ソニー),森 伸也(阪大)

1:15 PM - 1:30 PM

[16p-2D-1] Development of Scanning Spreading Resistance Microscopy (SSRM) to Failure Analysis

〇YOHEI HAYASE1, KEIRYO HARA1, SHINSUKE OGATA1, LI ZHANG2, HARUKO AKUTSU1 (1.S&S Co. Toshiba Corp., 2.R&D Center Toshiba Corp.)

Keywords:SSRM,P-N junction,Failure analysis

Much attention has been paid to Scanning Spread Resistance Microscopy (SSRM) for visualizing impurity diffusion layer. We report applications of SSRM to failure analysis. It is possible to clarify PN-junction errore for advanced devices. SSRM can observe defect implantation area detected by defect localization techniques with high spatial resolution.