[16p-2Q-1~13] 8.3 deposition of thin film and surface treatment

[16p-2Q-6] Large area hydrogen free SiNx thin film deposition by ICP-CVD

〇EIJI TAKAHASHI¹, SYUNJI TAKASE¹, MASAMITSU TORAMARU², TORU MASHITA² (1.Nissin Electric, 2.The Japan Steel Works)

Keywords:chemical Vapor deposition,oxide semiconductor,inductive coupled plasma