The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

13 Semiconductors » 13.8 Compound and power electron devices and process technology

[16p-4C-1~9] 13.8 Compound and power electron devices and process technology

Wed. Sep 16, 2015 1:30 PM - 3:45 PM 4C (432)

座長:末光 哲也(東北大)

3:15 PM - 3:30 PM

[16p-4C-8] β-Ga2O3 Schottky Barrier Diode with Field Plate Edge Termination

〇Kohei Sasaki1,2, Masataka Higashiwaki2, Ken Goto1, Kazushiro Nomura3, Quang Tu Thieu4, Rie Togashi3, Hisashi Murakami3, Yoshinao Kumagai3, Bo Monemar4,5, Akinori Koukitu3, Akito Kuramata1, Shigenobu Yamakoshi1 (1.Tamura Corp., 2.NICT, 3.Tokyo Univ. of Agri. & Tech., 4.TUAT GIRO, 5.Linkoping Univ.)

Keywords:Ga2O3,Schottky barrier diode,field plate

β-Ga2O3 will be useful as a next-generation high power device material because of its excellent material properties and ease of mass production. In this study, we fabricated a β-Ga2O3 Schottky barrier diode with field plate edge termination. The device had a high breakdown voltage of 920 V, with a specific on-resistance of 5.0 mΩ•cm2 and a barrier height of 1.14 eV at room temperature.