Oral presentation

[11a-D8-1~10] 6.4 Thin films and New materials

Wed. Mar 11, 2015 9:00 AM - 11:45 AM D8 (16-303)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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9:00 AM - 9:15 AM

[11a-D8-1] Epitaxial growth of Al₄C₃ from (CH)_n polymer and Al₂O₃(0001)

Ohmi Kosuke¹, Hasegawa Koki², Yanase Takashi², Nagahama Taro², 〇Toshihiro Shimada² (1.Hokkaido Univ. CSE, 2.Hokkaido Univ. Eng)

9:15 AM - 9:30 AM

[11a-D8-2] Temperature dependence of conductivity of ionic liquid nano-thin films

〇Shingo Maruyama¹, Kaho Toyabe¹, Yuji Matsumoto¹ (1.Tohoku Univ.)

9:30 AM - 9:45 AM

[11a-D8-3] LiH thin film growth by pulsed laser deposition

〇Hiroyuki Oguchi¹, Susumu Shiraki², Hiroki Kuwano¹, Shin-ichi Orimo^2,³, Taro Hitosugi² (1.Tohoku Univ., 2.Tohoku Univ. AIMR, 3.Tohoku Univ. IMR)

9:45 AM - 10:00 AM

[11a-D8-4] Separation between Hybrid Orientation CeO$_2$ Regions on Si(100) Substrates

〇Tomoyasu Inoue¹, Shigenari Shida¹ (1.Iwaki Meisei Univ.)

10:00 AM - 10:15 AM

[11a-D8-5] Formation of TiO₂ films by the thermal oxidization of titanium films deposited by a glancing angle deposition

〇Youichi Hoshi¹, Shin-ichi Kobayashi¹, Naoto Kitahara¹, Yutaka Sawada¹ (1.Tokyo Polytech Univ.)

Break （10:15 AM - 10:30 AM）

10:30 AM - 10:45 AM

[11a-D8-6] SnO₂ thin films prepared with two-dimensional non-equilibrium plasma

Syota Kanezashi¹, Toshimichi Hanai¹, Masato Tan¹, 〇Masayuki Okuya^1,² (1.Shizuoka Univ., 2.Green Energy, Shizuoka Univ.)

10:45 AM - 11:00 AM

[11a-D8-7] TiO₂ thin films prepared with non-equilibrium plasma under controlled atmosphere

〇YUKI MASUDA¹, MASATO TAN¹, SYOTA KANEZASHI¹, MASAYUKI OKUYA^1,² (1.Shizuoka Univ., 2.Green Energy, Shizuoka Univ.)

11:00 AM - 11:15 AM

[11a-D8-8] Effect of surface of glass substrate on Mg₂Sn thin film preparation

〇tatsuki yokoyama¹, Mikihiko Nishitani², Yukihiro Morita², Kurashiki Tetsusei¹ (1.Osaka Univ., 2.Panasonic Corporation)

11:15 AM - 11:30 AM

[11a-D8-9] Formation of SiO2 Vitrified Film Hardened at Room Temperature in Sealing Space

〇Toshiyuki Kaeriyama

11:30 AM - 11:45 AM

[11a-D8-10] Metal oxide films synthesized with diameter-controlled metal–EDTA complexes

Tomoyuki Shirai¹, D.Y. Xin¹, 〇Keiji Komatsu¹, Atsushi Nakamura^1,², Shigeo Ohshio¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.ChubuChelestCo.,Ltd.)

Oral presentation

[12a-D8-1~10] 6.4 Thin films and New materials

Thu. Mar 12, 2015 9:00 AM - 11:45 AM D8 (16-303)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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9:00 AM - 9:15 AM

[12a-D8-1] Annealing temperature dependency of the film composition of Sr₂SiO₄ thin film produced by the taget Sr₂SiO₄

〇(M1)Keiji Imanishi¹, Shota Taniwaki¹, Mitsuhiro Umano¹, Yasushi Hotta^1,³, Haruhiko Yoshida^1,³, Koji Arafune^1,³, Atsushi Ogura^2,³, Shin-ichi Satoh^1,³ (1.Univ.of Hyogo, 2.Meiji Univ., 3.JST-CREST)

9:15 AM - 9:30 AM

[12a-D8-2] Fabrication of tricolor superstructures of two High-k materials and SiO_x

〇Shozo Miyake¹, Yuki Toyoshima¹, Satoshi Ueoka¹, Yasushi Hotta^1,³, Haruhiko Yoshida^1,³, Koji Arafune^1,³, Atsushi Ogura^2,³, Shin-ichi Satoh^1,³ (1.Univ. of Hyogo, 2.Meiji Univ., 3.JST-CREST)

9:30 AM - 9:45 AM

[12a-D8-3] Cr₂O₃ Films Growth and Structure Analysis on YAlO₃(001) Substrates

〇kousuke hasimoto¹, takashi sumida¹, yutaro hayashi¹, takumi nakamura¹, tomoko nagata¹, hiroshi yamamoto¹, nobuyuki iwata¹ (1.CST Nihon Univ.)

9:45 AM - 10:00 AM

[12a-D8-4] Electrical /Magnetic properties of [CaFeO_x / LaFeO₃] artificial superlattice

〇Keisuke Ohshima¹, Yuta Watabe¹, Takahiro Oikawa¹, Takaaki Inaba¹, Chun Wang¹, Huaping Song¹, Tomoko Nagata¹, Koichi Takase¹, Takuya Hashimoto², Hiroshi Yamamoto¹, Nobuyuki Iwata¹ (1.CST Nihon Univ., 2.CHS Nihon Univ.)

10:00 AM - 10:15 AM

[12a-D8-5] Epitaxy of SmFe₇ films and the magnetic properties of its nitrogenized films

〇Takeshi Kusumori¹, Asaya Fujita¹, Kimihiro Ozaki¹ (1.AIST)

Break （10:15 AM - 10:30 AM）

10:30 AM - 10:45 AM

[12a-D8-6] Samarium Monoxide Thin Films Grown by PLD Method

〇Yutaka Uchida¹, Kenichi Kaminaga¹, Tomoteru Fukumura^1,², Tetsuya Hasegawa^1,² (1.Univ. Tokyo, 2.JST-CREST)

10:45 AM - 11:00 AM

[12a-D8-7] Growth and characterization of Fe₃O₄ films for high-temperature resistor applications

〇Kohei Fujiwara¹, Satoshi Tsubota¹, Hidekazu Tanaka¹ (1.ISIR, Osaka Univ.)

11:00 AM - 11:15 AM

[12a-D8-8] Fabrication of LaVO₃ thin films on Si substrates by PLD

〇(M1)Ryo Inagaki¹, Masashi Chikanari¹, Yasushi Hotta¹, Shin-ichi Satoh¹ (1.Univ.of Hyogo)

11:15 AM - 11:30 AM

[12a-D8-9] Selective growth of VO₂ (B) and VO₂ (M) by biased sputtering method

〇Kai So¹, NurulHanis BinitAzhan¹, Okimura Kunio¹ (1.Tokai Univ.)

11:30 AM - 11:45 AM

[12a-D8-10] Spinodal decomposition in (Ti_0.4V_0.6)O₂ thin films

〇Yuji Muraoka¹, Otsuka Tubasa¹, Terashima Kensei¹, Wakita Takanori¹, Yokoya Takayoshi¹ (1.Okayama Univ.)

Oral presentation

[12p-D8-1~19] 6.4 Thin films and New materials

Thu. Mar 12, 2015 1:15 PM - 6:30 PM D8 (16-303)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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1:15 PM - 1:30 PM

▲ [12p-D8-1] [Young Scientist Presentation Award Speech] Thermoplasmonic control of Marangoni flow around a micro bubble

〇Kyoko Namura^1,², Kaoru Nakajima¹, Kenji Kimura¹, Motofumi Suzuki¹ (1.Kyoto Univ., 2.J S P S Research Fellow)

1:30 PM - 1:45 PM

▲ [12p-D8-2] Nanoscale measurements of the work function in nanocrystalline TiN and amorphous films by multimode scanning probe microscopy and spectroscopy

〇Leonid Bolotov¹, Takashi Matsukawa¹, Koichi Fukuda¹, Meishoku Masahara¹, Tetsuya Tada¹ (1.AIST)

1:45 PM - 2:00 PM

▲ [12p-D8-3] Measurements of absolute densities of Cu, Zn, Sn and S atoms in magnetron sputtering plasma employing a Cu₂ZnSnS₄ target

〇Nayan Nafarizal^1,², Koichi Sasaki¹ (1.Hokkaido Univ., 2.Univ. Tun Hussein Onn Malaysia)

2:00 PM - 2:15 PM

▲ [12p-D8-4] Characterization of Thick AlN Templates Grown on Micro-circle Patterned-Si Substrates

〇(P)Tinh Tran¹, Noritoshi Maeda¹, Shiro Toyoda¹, Hideki Hirayama¹ (1.RIKEN)

2:15 PM - 2:30 PM

▲ [12p-D8-5] Low-temperature fabricating uniform and controllable ZnO Nanorods

〇(DC)Shengwen Hou¹, Miyuki Nishino¹, Chaoyang Li¹ (1.Kochi Univ. Tech.)

2:30 PM - 2:45 PM

▲ [12p-D8-6] Influence of N₂O doped buffer layer on the properties of ZnO thin films on glass substrates grown by catalytic-reaction-assisted chemical vapor deposition

Yuuki Ishidzuka¹, Yuuki Ohashi¹, Hironori Katagiri², Koichiro Oishi², Yasuhiro Tamayama¹, Takahiro Kato¹, 〇Kanji Yasui¹ (1.Nagaoka Univ. Technol., 2.Nagaoka. Nat. Coll. Technol.)

2:45 PM - 3:00 PM

▲ [12p-D8-7] Spinel Oxide Flexible Film Thermistors

〇Tomohiko Nakajima¹, Tetsuo Tsuchiya¹ (1.AIST)

3:00 PM - 3:15 PM

▼ [12p-D8-8] Electron Transport Mechanism of Oxygen-doped Zinc Nitride Thin Films

〇(D)Xiang Cao¹, Atsushi Sato¹, Yoshihiko Ninomiya¹, Naoomi Yamada¹ (1.Chubu Univ.)

Break （3:15 PM - 3:30 PM）

3:30 PM - 3:45 PM

△ [12p-D8-9] Transparent ferromagnetic iron film

〇Masashi Chihara¹, Naoki Sumiya¹, Ryosuke Fujimoto¹, Ibuki Nakamura¹, Takafumi Hatano¹, Kazumasa Iida¹, Hiroshi Ikuta¹ (1.Nagoya Univ.)

3:45 PM - 4:00 PM

△ [12p-D8-10] Preparation of Sr substituted hydroxyapatite thin films using pulsed laser deposition

〇(B)Ayaka Saito¹, Yoshiya Hashimoto², Hiroaki Nishikawa¹ (1.B.O.S.T., Kinki Univ., 2.Osaka Dental Univ.)

4:00 PM - 4:15 PM

△ [12p-D8-11] Effects of Intensity Distribution of the Laser Spot on the Chemical Composition for Hydroxyapatite Thin Films in Pulsed Laser Deposition

〇(M1)TSUKASA HASEGAWA¹, Yoshiya HASHIMOTO², Hiroaki NISHIKAWA³ (1.Grad. Sch. B.O.S.T., Kinki Univ., 2.Osaka Dental Univ., 3.B.O.S.T., Kinki Univ.)

4:15 PM - 4:30 PM

△ [12p-D8-12] Preparation of Free-Standing Au Thin Film on Multi-hole Substrate by Immersing-release and scoop-up method

〇yu miyamoto¹, masahumi yamano¹, yuma fujii¹, yoshiyuki suda¹, hirofumi takikawa¹, hideto tanoue², mamiko nishiuchi³, hironao sakaki³, kiminori kondo³ (1.Toyohashi Unive.Tech., 2.Kitakyushu National College of Tech., 3.Japan atomic energy agency)

4:30 PM - 4:45 PM

△ [12p-D8-13] Solid-phase crystallization behavior of functional oxide thin films via post-annnealing under uniaxial compression

〇Yasuhisa Nozawa¹, Geng Tan¹, Tomoyuki Funabasama¹, Satoru Kaneko², Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Tech, 2.Kanagawa Ind. Tech.)

4:45 PM - 5:00 PM

△ [12p-D8-14] Hexagonal NbS₂ flakes fabricated by chemical vapor deposition

〇Takashi Yanase¹, Syo Watanabe¹, Mengting Weng¹, Taro Nagahama¹, Toshihiro Shimada¹ (1.Hokkaido Univ.)

5:00 PM - 5:15 PM

△ [12p-D8-15] Application study of Al nitride-based optical absorption thin film to metal-mesh electrode

〇YOKO SHIDA¹, MOTOTAKA OCHI¹, HIROSHI GOTO¹, TOSHIHIRO KUGIMIYA¹, HIROYUKI OKUNO², MORIYOSHI KANAMARU² (1.KOBE STEEL, LTD., 2.KOBELCO Research Institute, Inc.)

Break （5:15 PM - 5:30 PM）

5:30 PM - 5:45 PM

[12p-D8-16] Fabrication of transmissive copper thin films by mist chemical vapor deposition method

〇masaki ueno¹, Takumi Ikenoue¹, Masao Miyake¹, Tetsuji Hirato¹ (1.Kyoto Univ.)

5:45 PM - 6:00 PM

[12p-D8-17] Mechanical Prooertiies of TiO₂ optical thin films

〇Mamoru Hao¹, Hiroshi Murotani¹ (1.Toukai univ.)

6:00 PM - 6:15 PM

[12p-D8-18] Adhesion of Optical Thin Films on Acrylic Substrates

〇Naoya Tajima¹, Hiroshi Murotani¹, Shigeharu Matumoto², Hiromitu Honda² (1.Tokai Univ., 2.SHINCRON CO.,LTD.)

6:15 PM - 6:30 PM

[12p-D8-19] Time dependence of internal stress of Lanthanum Titanium Oxide (H4) optical thin film

〇Ryota Nakano¹, Hiroshi Murotani¹ (1.Tokai Univ.)

Poster presentation

[13p-P6-1~6] 6.4 Thin films and New materials

Fri. Mar 13, 2015 4:30 PM - 6:30 PM P6 (Gymnasium)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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4:30 PM - 6:30 PM

▼ [13p-P6-1] Flexible flow through transition metal doped TiO₂ nanotubular film for photocatalytic applications

〇(DC)Amir Abidov^1,², Bunyod Allabergenov¹, Feiyi Xiao¹, Cuili Chu¹, Xing Jin¹, Yong Bae Kim², Min Kyu Song⁴, Cho-Hyun Jeon⁴, Hitoshi Habuka³, Sungjin Kim¹ (1.Kumoh Nat. Inst. Tec, 2.Gumi Elec. Res. Inst, 3.Yokohama univ., 4.Korea Tex. Dev. Inst)

4:30 PM - 6:30 PM

▲ [13p-P6-2] Comprehensive study about ZnO film growth on (001) Si substrate by rf-sputtering

〇Dongcheol Oh¹, Kangbok Kim¹, Sooman Lee¹ (1.Defense Sci. & Tech. Hoseo University)

4:30 PM - 6:30 PM

▲ [13p-P6-3] Electron transport of ZnO films on semi-insulating, p-type, and n-type (001) Si substrates

〇Dongcheol Oh¹, Sooman Lee¹, Kangbok Kim¹ (1.Defense Sci. & Tech. Hoseo University)

4:30 PM - 6:30 PM

[13p-P6-4] Preparation and Evaluation of BiFeO₃Thin Films using Bi excess BiFeO_x Target Synthesized by Pechini Method

〇Chun Wang¹, Keisuke Oshima¹, Takaaki Inaba¹, Huaping Song¹, Yuta Watabe¹, Tomoko Nagata¹, Takuya Hashimoto², Kouichi Takase¹, Hiroshi Yamamoto¹, Nobuyuki Iwata¹ (1.CST Nihon Univ., 2.CHS Nihon Univ.)

4:30 PM - 6:30 PM

[13p-P6-5] Temperature Dependence of Resistivity and Hall Coefficient of MoSi₂-Si Composite Thin Films

Kitani Ryosuke¹, 〇kousuke shimozono¹, Yuuki Sato¹, Shinzou Yoshikado¹ (1.Doshisha Univ.)

4:30 PM - 6:30 PM

[13p-P6-6] Synthesis of Y₂O₃ films with quick thermal cycling resistance with metal–EDTA complex

Ayumu Toyama¹, Tomoyuki Shirai¹, Akinori Satoh¹, D.Y. Xin¹, 〇Keiji Komatsu¹, Atsushi Nakamura^1,², Ikumi Toda¹, Shigeo Ohshio¹, Hiroyuki Muramatsu¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.ChubuChelest Co.,Ltd.)

Sessions

6 Thin Films and Surfaces » 6.4 Thin films and New materials

[11a-D8-1~10] 6.4 Thin films and New materials

[12a-D8-1~10] 6.4 Thin films and New materials

[12p-D8-1~19] 6.4 Thin films and New materials

▲ [12p-D8-1] [Young Scientist Presentation Award Speech] Thermoplasmonic control of Marangoni flow around a micro bubble

▲ [12p-D8-2] Nanoscale measurements of the work function in nanocrystalline TiN and amorphous films by multimode scanning probe microscopy and spectroscopy

▲ [12p-D8-3] Measurements of absolute densities of Cu, Zn, Sn and S atoms in magnetron sputtering plasma employing a Cu2ZnSnS4 target

▲ [12p-D8-4] Characterization of Thick AlN Templates Grown on Micro-circle Patterned-Si Substrates

▲ [12p-D8-5] Low-temperature fabricating uniform and controllable ZnO Nanorods

▲ [12p-D8-6] Influence of N2O doped buffer layer on the properties of ZnO thin films on glass substrates grown by catalytic-reaction-assisted chemical vapor deposition

▲ [12p-D8-7] Spinel Oxide Flexible Film Thermistors

▼ [12p-D8-8] Electron Transport Mechanism of Oxygen-doped Zinc Nitride Thin Films

△ [12p-D8-9] Transparent ferromagnetic iron film

△ [12p-D8-10] Preparation of Sr substituted hydroxyapatite thin films using pulsed laser deposition

△ [12p-D8-11] Effects of Intensity Distribution of the Laser Spot on the Chemical Composition for Hydroxyapatite Thin Films in Pulsed Laser Deposition

△ [12p-D8-12] Preparation of Free-Standing Au Thin Film on Multi-hole Substrate by Immersing-release and scoop-up method

△ [12p-D8-13] Solid-phase crystallization behavior of functional oxide thin films via post-annnealing under uniaxial compression

△ [12p-D8-14] Hexagonal NbS2 flakes fabricated by chemical vapor deposition

△ [12p-D8-15] Application study of Al nitride-based optical absorption thin film to metal-mesh electrode

[13p-P6-1~6] 6.4 Thin films and New materials

▼ [13p-P6-1] Flexible flow through transition metal doped TiO2 nanotubular film for photocatalytic applications

▲ [13p-P6-2] Comprehensive study about ZnO film growth on (001) Si substrate by rf-sputtering

▲ [13p-P6-3] Electron transport of ZnO films on semi-insulating, p-type, and n-type (001) Si substrates

Authentication

▲ [12p-D8-3] Measurements of absolute densities of Cu, Zn, Sn and S atoms in magnetron sputtering plasma employing a Cu₂ZnSnS₄ target

▲ [12p-D8-6] Influence of N₂O doped buffer layer on the properties of ZnO thin films on glass substrates grown by catalytic-reaction-assisted chemical vapor deposition

△ [12p-D8-14] Hexagonal NbS₂ flakes fabricated by chemical vapor deposition

▼ [13p-P6-1] Flexible flow through transition metal doped TiO₂ nanotubular film for photocatalytic applications