The 62nd JSAP Spring Meeting, 2015

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13 Semiconductors » 13.4 Si wafer processing /MEMS/Integration technology

[11a-A29-1~13] 13.4 Si wafer processing /MEMS/Integration technology

Wed. Mar 11, 2015 9:00 AM - 12:30 PM A29 (6A-204)

11:15 AM - 11:30 AM

[11a-A29-9] Preparation of PZT films using continual process of Minimal PZT Sol-Gel Station

〇Junko Kazusa1, Kazuhiro Koga1, Norio Umeyama1, daiji Noda3, Yoshihisa Sensu1, 4, Takashi Chiba1, 5, Masao Terada1, 5, Sommawan Khumpuang1, 2, Shiro Hara1, 2 (1.MINIMAL, 2.AIST, 3.MMC, 4.Litho Tech Japan, 5.SAKAGUCHI E.H VOC CORP)

Keywords:Minimal