The 62nd JSAP Spring Meeting, 2015

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7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[11a-B2-1~10] 7.3 Micro/Nano patterning and fabrication

Wed. Mar 11, 2015 9:00 AM - 11:45 AM B2 (6B-102)

9:00 AM - 9:15 AM

[11a-B2-1] Optimization of F-Number for Desktop Liquid-Crystal-Display Exposure System

〇Toshiyuki Horiuchi1, Soichiro Koyama1, Hiroshi Kobayashi1 (1.Tokyo Denki Univ.)

Keywords:lithography,projection exposure,F-number