[11a-B2-1~10] 7.3 Micro/Nano patterning and fabrication

[11a-B2-2] Computational study on 3-dimensonal exposure by Built-in lens mask lithography II

Naoki Ueda¹, Toshiki Tanaka¹, Hisao Kikuta¹, Hiroaki Kawata¹, Masaru Sasago¹, 〇Yoshihiko Hirai¹ (1.Osaka Pref. Univ.)

Keywords:lithography,3 dimension