[11a-B2-1~10] 7.3 Micro/Nano patterning and fabrication

[11a-B2-3] Reduction of power consumption by optimization of chamber structure and gas flow speed in ArF excimer laser for semiconductor lithography

〇Hiroyuki Ikeda¹, Akira Suwa¹, Hisakazu Katsuumi¹, Hiroaki Tsushima¹, Takahito Kumazaki¹, Akihiko Kurosu¹, Takeshi Ohta¹, Kouji Kakizaki¹, Takashi Matsunaga¹, Hakaru Mizoguchi¹ (1.Gigaphoton)

Keywords:lithography,excimer,ArF