The 62nd JSAP Spring Meeting, 2015

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7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[11a-B2-1~10] 7.3 Micro/Nano patterning and fabrication

Wed. Mar 11, 2015 9:00 AM - 11:45 AM B2 (6B-102)

10:00 AM - 10:15 AM

△ [11a-B2-5] EUV Mask Observations Using a Coherent EUV Scatterometry Microscope with a High-Harmonic-Generation Source (II)

〇Takahiro Fujino1, Yusuke Tanaka1, Tetsuo Harada1, Yutaka Nagata2, Takeo Watanabe1, Hiroo Kinoshita1 (1.Univ. of Hyogo, 2.RIKEN)

Keywords:EUV Mask,CSM,Mask Observation