The 62nd JSAP Spring Meeting, 2015

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[11a-B2-1~10] 7.3 Micro/Nano patterning and fabrication

Wed. Mar 11, 2015 9:00 AM - 11:45 AM B2 (6B-102)

10:15 AM - 10:30 AM

[11a-B2-6] Development of EUV Polarizer System for Accurate Reflectance Measurement of an EUV collector mirror

〇Haruki Iguchi1 (1.Univ. of Hyogo)

Keywords:semiconductor,lithography,reflectometer