[11a-C2-1~13] 16.3 Bulk, thin-film and other silicon-based solar cells

△ [11a-C2-6] Passivation properties of AlO_x thin film grown at low-temperature by a novel reaction supported mist CVD

〇Takayuki Uchida¹, Toshiyuki Kawaharamura², Shizuo Fujita¹, Takahiro Hiramatsu³, Hiroyuki Orita³ (1.Graduate School of Eng., Kyoto Univ., 2.Res. Inst., Kochi Univ. of Tech, 3.TMEIC)

Keywords:passivation,Aluminum Oxide,mist CVD