The 62nd JSAP Spring Meeting, 2015

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Joint Session K » Joint Session K

[11a-D1-1~8] Joint Session K

Wed. Mar 11, 2015 9:30 AM - 11:45 AM D1 (16-101)

9:45 AM - 10:00 AM

[11a-D1-2] Enlarged process window in Nb:TiO2 transparent conductive films with two-step anneal

〇Shoichiro Nakao1, 2, Yasushi Hirose1, 2, 3, Tetsuya Hasegawa1, 2, 3 (1.KAST, 2.CREST, 3.Univ. of Tokyo)

Keywords:Nb-doped TiO2,sputtering