[11a-D10-1~10] 6.3 Oxide electronics

[11a-D10-1] Preparation of transparent p-type NiO films by facing-target reactive-sputtering method and their application for CdTe solar cells.

〇Yasuaki Furaya¹, Ryoichi Araki¹, Yohei Ogawa², Aikyo Hosono², Takahiro Nomoto¹, Ryosuke Ishikawa¹, Tamotsu Okamoto², Nozomu Tsuboi¹ (1.Niigata University, 2.Kisarazu National College of Technology)

Keywords:semiconductor,NiO