The 62nd JSAP Spring Meeting, 2015

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Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[11a-D10-1~10] 6.3 Oxide electronics

Wed. Mar 11, 2015 9:00 AM - 11:45 AM D10 (16-305)

9:15 AM - 9:30 AM

[11a-D10-2] Carrier concentration control of Li-doped NiO thin films by RF reactive sputtering

〇Hiroshi Nakai1, Ryo Maeda1, Airi Ogasawara1, Kazuma Moriyama1, Daisuke Kawade1, Shigefusa Chichibu2, Mutsumi Sugiyama1 (1.Faculty of Science & Technology/RIST, Tokyo Univ. of Science, 2.IMRAM, Tohoku Univ)

Keywords:NiO,sputter,p type transparent oxide semiconductor