The 62nd JSAP Spring Meeting, 2015

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Oral presentation

7 Beam Technology and Nanofabrication » 7.1 X-ray technologies

[11p-A26-1~16] 7.1 X-ray technologies

Wed. Mar 11, 2015 1:15 PM - 5:30 PM A26 (6A-201)

5:00 PM - 5:15 PM

[11p-A26-15] Property of EUV emission from multi-charged state germanium (Ge) ions

〇(M1)Hiroyuki Hara1, Thanh-Hung Dinh2, Hayato Ohashi3, Hiroyuki Sakaue4, Chihiro Suzuki4, Daichi Kato4, Izumi Murakami4, Takeshi Higashiguchi1, 2 (1.Utsunomiya Univ., 2.CORE, Utsunomiya Univ., 3.Univ. Toyama, 4.NIFS)

Keywords:EUV,Atomic process,Lithography