The 62nd JSAP Spring Meeting, 2015

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7 Beam Technology and Nanofabrication » 7.1 X-ray technologies

[11p-A26-1~16] 7.1 X-ray technologies

Wed. Mar 11, 2015 1:15 PM - 5:30 PM A26 (6A-201)

5:15 PM - 5:30 PM

[11p-A26-16] Characteristics of a high-brightness EUV source

〇(M1)Goki Arai1, Hiroyuki Hara1, Thanh-Hung Dinh2, Atsushi Sunahara3, Taisuke Miura4, Akira Endo4, Takeshi Higashiguchi1, 2 (1.Utsunomiya Univ., 2.CORE, Utsunomiya Univ., 3.Inst. of Laser Technol, 4.HiLASE Center)

Keywords:extreme ultraviolet,high-brightness,lithography