The 62nd JSAP Spring Meeting, 2015

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7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[11p-B2-1~11] 7.3 Micro/Nano patterning and fabrication

Wed. Mar 11, 2015 1:15 PM - 4:30 PM B2 (6B-102)

2:00 PM - 2:15 PM

[11p-B2-3] Rapid growth behavior of microphase-separation structure of PS-b-PMMA for directed self-assembly lithography

〇Nobuya Hiroshiba1, Ryo Okubo1, Azusa Hattori2, Hidekazu Tanaka2, Masaru Nakagawa1 (1.IMRAM, Tohoku Univ., 2.ISIR, Osaka Univ.)

Keywords:block copolymer,directed self-assembly