The 62nd JSAP Spring Meeting, 2015

Presentation information

Print

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[11p-B2-1~11] 7.3 Micro/Nano patterning and fabrication

Wed. Mar 11, 2015 1:15 PM - 4:30 PM B2 (6B-102)

3:00 PM - 3:15 PM

△ [11p-B2-6] Dependence of release force on sidewall slope angle of mold pattern in nanoimprint II

〇(M1C)Takamitsu Tochino1, Kazuo Fujii1, Marcin Michalowski2, Kimiaki Uemura1, Hiroaki Kawata1, Zygmunt Rymuza2, Yoshihiko Hirai1 (1.Osaka Pref. Univ., 2.Warsaw Univ. of Technology)

Keywords:thermal nanoimprint,UV nanoimprint,mold mask