[11p-B5-1~9] Advanced CMOS Technology and Its Future Scope

[11p-B5-9] Passivation Schemes for Ge High-K Metal Gate MOSFETs on Si for VLSI Production

〇Genji Nakamura¹, Kandabara Tapily², Robert Clark², David O'Meara², Steve Consiglio², Richard Gaylord², Cory Wajda², Gert Leusink², Tat Ngai³, Dmitry Veksler³, Chris Hobbs³, Ken Matthews³, David Gilmer³, Paul Kirsch³ (1.Tokyo Electron Limited, 2.TEL Technology Center, America, LLC, 3.SEMATECH)

Keywords:High mobility channel material