Catalytic Effect of Substrate-Si on SiO2-IL Scavenging in HfO2/SiO2/Si Stacks

Presentation information

Oral presentation

13 Semiconductors » 13.6 Semiconductor English Session

Thu. Mar 12, 2015 9:00 AM - 12:15 PM A23 (6A-216)

11:30 AM - 11:45 AM

〇(DC)Xiuyan Li¹, Takeaki Yajima¹, Tomonori Nishimura¹, Akira Toriumi¹ (1.Univ. of Tokyo)

Keywords:HfO2 gate stack,SiO2-IL scavenging,catalytic effect