[12a-A29-1~11] 13.4 Si wafer processing /MEMS/Integration technology

[12a-A29-3] Dependence of Silicon Grain Growth by Micro-Thermal-Plasma-Jet Irradiation on Precursor Films

〇Shohei Hayashi^{1, 2}, Seiji Morisaki¹, Shogo Yamamoto¹, Taichi Nakatani¹, Ryota Shin¹, Seiichiro Higashi¹ (1.Grad. School of AdSM, Hiroshima Univ., 2.JSPS Research Fellow PD)

Keywords:crystallization,thermal plasma jet,grain growth