[12a-D1-1~12] Joint Session K

[12a-D1-4] Effects of Oxygen-Gas-Flow Rates and Ga Contents on Structural Properties of Ga-Doped ZnO Films Prepared by Reactive Plasma Deposition with a DC Arc Discharge

〇Tomoaki Terasako¹, Junichi Nomoto², Hisao Makino², Sho Shirakata¹, Tetsuya Yamamoto² (1.Grad. School Sci. & Eng., Ehime Univ., 2.Research Inst., Kochi Univ. Technol.)

Keywords:ZnO,reactive plasma deposition,film