[12p-A29-1~11] How should we behave as future scientists? - Innovative value creation of integration technology by young generations -

[12p-A29-4] The influence that FGA process gives for the thermal resistance of the Cr/SiO₂/Si interface

〇Arisa Kumada¹, Go Takeuchi¹, Tsutomu Miyata¹, Tsunaki Takahashi^{1, 2}, Ken Uchida^{1, 2} (1.Dept. Electronics and Electrical Eng., Keio Univ., 2.CREST, Japan Science and Technology Agency)

Keywords:3 omega method,Thermal boundary resistance,FGA