The 62nd JSAP Spring Meeting, 2015

Presentation information

Symposium

Symposium » The latest trend of the lithography technology

[12p-C3-1~4] The latest trend of the lithography technology

Thu. Mar 12, 2015 1:15 PM - 3:30 PM C3 (6C-201)

1:15 PM - 2:00 PM

[12p-C3-1] Development of lithography and current status of EUV lithography

〇Shinji Okazaki1 (1.GPI)

Keywords:lithography,reduction projection exposure,extreme ultra violet