[12p-C3-1~4] The latest trend of the lithography technology

[12p-C3-2] Enabled Scaling in Multiple-patterning

〇Hidetami Yaegashi¹, Kenichi Oyama¹, Shohei Yamauchi¹, Arisa Hara¹, Sakurako Natori¹, Masatoshi Yamato¹, Noriaki Okabe¹, Kyohei Koike¹ (1.Tokyo Electron limited)

Keywords:Multi-patterning,1D Layout,Line Edge Roughness