[12p-C3-1~4] The latest trend of the lithography technology

[12p-C3-3] Modeling and Optimization of Directed Self-Assembly Process

〇Kenji Yoshimoto¹, Ken Fukawatase¹, Yoshihiro Hori¹, Yusuke Zeniya¹, Masahiro Ohshima¹ (1.Kyoto Univ.)

Keywords:directed self-assembly,block copolymer,lithography