The 62nd JSAP Spring Meeting, 2015

Presentation information

Symposium

Symposium » The latest trend of the lithography technology

[12p-C3-1~4] The latest trend of the lithography technology

Thu. Mar 12, 2015 1:15 PM - 3:30 PM C3 (6C-201)

3:00 PM - 3:30 PM

[12p-C3-4] Nanoimprint systems for high volume semiconductor manufacturing

〇Kazunori Iwamoto1, Sakai Keita1, Iwanaga Takehiko1, Takabayashi Yukio1 (1.CANON INC.)

Keywords:Nanoimprint