[12p-P10-1~8] 8.3 deposition of thin film and surface treatment

[12p-P10-7] Fabrication of a-Si:H:F at Cryogenic Temperature and Crystallization by Laser Annealing

〇Nao Sakamaki¹, Tetsuya Sato¹, Kiyokazu Nakagawa¹ (1.Univ. of Yamanashi)

Keywords:amorphous silicon,nano crystal silicon,Cryogenic Temperature