The 62nd JSAP Spring Meeting, 2015

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Oral presentation

13 Semiconductors » 13.3 Insulator technology

[13a-A24-1~13] 13.3 Insulator technology

Fri. Mar 13, 2015 9:00 AM - 12:30 PM A24 (6A-217)

11:45 AM - 12:00 PM

▼ [13a-A24-11] Patterning of High-k/metal gate Stack by Neutral Beam Etching Technique for Sub-20 nm CMOS Technology

〇YinHsien Su1, 2, JiaNan Shih1, Tomohiro Kubota2, WenHsi Lee1, YingLang Wang3, Seiji Samukawa2 (1.National Cheng Kung Univ., 2.Tohoku Univ., 3.TSMC)

Keywords:Neutral beam etching,High-k/metal gate stack,TiN/HfO2