[13a-A24-1~13] 13.3 絶縁膜技術

▼ [13a-A24-11] Patterning of High-k/metal gate Stack by Neutral Beam Etching Technique for Sub-20 nm CMOS Technology

〇YinHsien Su^{1, 2}, JiaNan Shih¹, Tomohiro Kubota², WenHsi Lee¹, YingLang Wang³, Seiji Samukawa² (1.National Cheng Kung Univ., 2.Tohoku Univ., 3.TSMC)

キーワード：Neutral beam etching,High-k/metal gate stack,TiN/HfO2