Improvement of Insulating Property of Al<sub>2</sub>O<sub>3</sub> Film Utilizing Water Plasma Oxidation for ALD

Presentation information

Oral presentation

13 Semiconductors » 13.3 Insulator technology

Fri. Mar 13, 2015 9:00 AM - 12:30 PM A24 (6A-217)

11:00 AM - 11:15 AM

〇Tomoaki Umehara¹, Masahiro Horita¹, Koji Yoshitsugu¹, Yasuaki Ishikawa¹, Yukiharu Uraoka¹ (1.NAIST)

Keywords:Atomic Layer Deposition,Al2O3,Water Vapor Plasma