[13a-A27-1~13] 8.3 deposition of thin film and surface treatment

[13a-A27-7] Contribution of Cluster Incorporation and Surface Reactions of Radicals to Si-H₂ Bond Formation in Hydrogenated Amorphous Silicon Thin Films

〇Kazunori Koga¹, Susumu Toko¹, Yoshihiro Torigoe¹, Kimitaka Keya¹, Hyunwoong Seo¹, Naho Itagaki^{1, 2}, Masaharu Shiratani¹ (1.Kyushu Univ., 2.JST PRESTO)

Keywords:light-induced degradation,hydrogenated amorphous silicon,surface reaction