The 62nd JSAP Spring Meeting, 2015

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8 Plasma Electronics » 8.3 deposition of thin film and surface treatment

[13a-A27-1~13] 8.3 deposition of thin film and surface treatment

Fri. Mar 13, 2015 9:00 AM - 12:30 PM A27 (6A-202)

11:15 AM - 11:30 AM

[13a-A27-9] Low-temperature Deposition of a-IGZO Thin Films with Plasma Enhanced Reactive Sputtering and Its Characterization

Yuichi Setsuhara1, Keitaro Nakata1, Yutaro Suyama1, 〇Kosuke Takenaka1, Giichiro Uchida1, Akinori Ebe2 (1.Osaka Univ., 2.EMD Corp.)

Keywords:Oxide semiconductor