[13a-P11-1~2] 8.4 Plasma etching

[13a-P11-1] Analyses in subsurface of HfO₂ films etched by CF₄ /Ar /H₂ plasmas.

〇Shunsuke Ohmura¹, Kazuo Takahashi¹ (1.KIT)

Keywords:HfO2,CF4,etching