The 62nd JSAP Spring Meeting, 2015

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Poster presentation

8 Plasma Electronics » 8.4 Plasma etching

[13a-P11-1~2] 8.4 Plasma etching

Fri. Mar 13, 2015 9:30 AM - 11:30 AM P11 (Gymnasium)

9:30 AM - 11:30 AM

[13a-P11-2] Analysis of temperature dependence in Si etching by H plasma -Effect of diffusion of H in bulk and on surface-

〇Kohji Inagaki1, 2, Yoshitada Morikawa1, Kiyoshi Yasutake1, 2 (1.Osaka Univ., 2.JST-CREST)

Keywords:Si etching by H Plasma,diffusion,temperature dependence