[13p-A23-1~10] 13.5 Semiconductor devices and related techologies

[13p-A23-8] Retention Characteristics of 50 nm Al_xO_y ReRAM Array Before and After Endurance

〇Hiroki Yamazawa¹, Sheyang Ning^{1, 2}, Tomoko Ogura Iwasaki¹, Shuhei Tanakamaru¹, Koh Johguchi¹, Ken Takeuchi¹ (1.Chuo Univ., 2.Univ. of Tokyo)

Keywords:ReRAM,Retention Characteristics