[13p-A28-1~10] 8.1 Plasma production and control

[13p-A28-10] Effect of Applying AC Cathode Bias in RF Magnetron Sputtering

〇Akimoto Takahiro¹, Shindo Haruo¹, Isomura Masao¹ (1.Tokai univ.)

Keywords:plasma,sputtering