Poster presentation

[12p-P9-1~5] 8.1 Plasma production and control

Thu. Mar 12, 2015 4:00 PM - 6:00 PM P9 (Gymnasium)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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4:00 PM - 6:00 PM

▲ [12p-P9-1] Plasma Production and Stability in Electron Cyclotron Resonance Source

〇(D)Camille Romero¹, Motoi Wada¹ (1.Doshisha University)

4:00 PM - 6:00 PM

[12p-P9-2] Generation mechanizm of radio frequency plasma in NaCl solution

〇Tsunehiro Maehara¹, Shinya Matsutomo², Ayaka Tanaka¹, Shinobu Mukasa¹, Ayato Kawashima¹ (1.Ehime Univ., 2.National Institute of Technology, Niihama College)

4:00 PM - 6:00 PM

[12p-P9-3] Simulation of Plasma Behavior in AP Microwave Line Plasma

〇Haruka Suzuki¹, Suguru Nakano¹, Hitoshi Itoh^2,³, Makoto Sekine^1,², Masaru Hori^1,², Hirotaka Toyoda^1,² (1.Nagoya Univ., 2.PLANT, Nagoya Univ., 3.Tokyo Electron Ltd.)

4:00 PM - 6:00 PM

[12p-P9-4] Duty Ratio Dependence of Treatment Performance in In-line Liquid Treatment Device Using Pulsed-Microwave Plasma

〇Michiko Ito^1,³, Seigo Takashima³, Norio Nomura⁴, Tominori Kitagawa⁴, Hirotaka Toyoda^1,² (1.Nagoya Univ., 2.Plasma Nanotechnology Research Center, Nagoya Univ., 3.Plasma Center for Industrial Applications, 4.Sanshin Mfg. Co., Ltd.)

4:00 PM - 6:00 PM

△ [12p-P9-5] The investigation of solution plasma reaction field in water-alcohol mixture: The influence of hydrogen-bond on gas/liquid interface

〇Tomohito Sudare¹, Tomonaga Ueno^1,⁴, Nagahiro Saito^1,^2,^3,⁴ (1.Graduate School of Engineering, Nagoya Univ., 2.Green Mobility Collaborative Research Center, Nagoya Univ., 3.Institute of Innovation for Future Society, 4.JST-CREST)

Oral presentation

[13p-A28-1~10] 8.1 Plasma production and control

Fri. Mar 13, 2015 4:30 PM - 7:00 PM A28 (6A-203)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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4:30 PM - 4:45 PM

[13p-A28-1] ECR plasma sputtering apparatus partially substituting waveguides with coaxial cables

〇Housei Akazawa¹, Toshiro Ono² (1.NTT DIC, 2.Hirosaki Univ.)

4:45 PM - 5:00 PM

[13p-A28-2] Development of Photoresist Removal Process Using Microwave Excited Bubble Plasma in Water with Si Slot Antenna

〇Takuya Itou¹, Ishijima Tatsuo¹, Tanaka Yasunori¹, Uesugi Yoshihiko¹, Nishiyama Takashi², Horibe Hideo² (1.Kanazawa Univ., 2.Osaka city Univ.)

5:00 PM - 5:15 PM

[13p-A28-3] Improvement of electrodes for increasing various ion beam currents extracted from ECRIS

〇Youta Imai¹, Sho Kumakura¹, Takuya Nishiokada¹, Tomoki Nagaya¹, Shogo Hagino¹, Kazuki Ueda¹, Masayuki Muramatsu², Fuminobu Sato¹, Yushi Kato¹, Atsushi Kitagawa², Toshiyuki Iida¹ (1.Osaka Grad. Univ., 2.NIRS.)

5:15 PM - 5:30 PM

[13p-A28-4] Observing light emission from ECR multi-charged ion source plasma and considering its resonance phenomena

〇Takuya Nishiokada¹, Yota Imai¹, Sho Kumakura¹, Tomoki Nagaya¹, Kazuki Ueda¹, Shogo Hagino¹, Fuminobu Sato¹, Yushi Kato¹, Toshiyuki Iida¹ (1.Osaka Univ.)

5:30 PM - 5:45 PM

[13p-A28-5] Spatial Distribution of Electron Energy Distribution Function along to Field Lines on ECRIS

〇Sho Kumakura¹, Youta Imai¹, Tomoki Nagaya¹, Takuya Nishiokada¹, Kazuki Ueda¹, Shogo Hagino¹, Fuminobu Sato¹, Yushi Kato¹, Tosiyuki Iida¹ (1.Osaka Univ.)

5:45 PM - 6:00 PM

[13p-A28-6] Beam transport from the 1st to the 2nd stage and effect to the 1st stage plasma on the tandem type ECRIS by evaporation source installation

〇Tomoki Nagaya¹, Yota Imai¹, Sho Kumakura¹, Takuya Nishiokada¹, Kazuki Ueda¹, shogo Hagino¹, Fuminobu Sato¹, Yushi Kato¹, Toshiyuki Iida¹ (1.Osaka Univ.)

6:00 PM - 6:15 PM

△ [13p-A28-7] Optimization of Cylindrical Cavity Excitation for Large-Area Microwave Plasma Generation II

〇(B)Yuichi Hasegawa¹, Daisuke Ogawa¹, Keiji Nakamura¹, Satoru Kobayashi², Hideo Sugai³ (1.Chubu Univ., 2.Applied Materials, 3.NISRI)

6:15 PM - 6:30 PM

△ [13p-A28-8] Efficient second-harmonic generation by microwave plasma with metamaterial effect (II)

〇Akinori Iwai¹, Yoshihiro Nakamura¹, Osamu Sakai^1,² (1.Kyoto Univ., 2.Univ. Shiga Pref.)

6:30 PM - 6:45 PM

[13p-A28-9] Production of Atmospheric Pressure Line Plasma by Microwave

〇Hiroshi Miyata¹, Masato Uchida², Takeshi Yamaguchi¹, Haruo Shindo¹, Hiroshi Kuwahata¹, Masao Isomura¹ (1.Grad.Sch.,Tokai Univ., 2.Tokai Univ.)

6:45 PM - 7:00 PM

[13p-A28-10] Effect of Applying AC Cathode Bias in RF Magnetron Sputtering

〇Akimoto Takahiro¹, Shindo Haruo¹, Isomura Masao¹ (1.Tokai univ.)

Oral presentation

[14a-A28-1~10] 8.1 Plasma production and control

Sat. Mar 14, 2015 9:00 AM - 11:45 AM A28 (6A-203)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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9:00 AM - 9:15 AM

[14a-A28-1] Generation and Diagnostics of Atmospheric-pressure Non-equilibrium Plasma Generated Using Narrow-gap Electrode System

〇Toshiki Nakano¹, Takeshi Kitajima¹ (1.National Defense Academy)

9:15 AM - 9:30 AM

[14a-A28-2] RF plasma within a ceramic tube in pure water

〇Ayaka Tanaka¹, Tsunehiro Maehara¹ (1.Ehime Univ.)

9:30 AM - 9:45 AM

△ [14a-A28-3] Investigation of chemical reaction in liquid induced by atmospheric glow discharge in contact with liquid

〇AIHITO NITO¹, NAOKI SHIRAI¹, SATOSHI UCHIDA¹, FUMIYOSHI TOCHIKUBO¹ (1.Tokyo Metro.Univ.)

9:45 AM - 10:00 AM

△ [14a-A28-4] Development of Electrical Discharge Model for High-pressure Gases and Supercritical Fluids Taking into Account Dependence of Density Fluctuation on Considered Volume

〇(DC)Hitoshi Muneoka^1,², Keiichiro Urabe^1,², Sven Stauss¹, Kazuo Terashima¹ (1.Univ. Tokyo, 2.JSPS Research Fellow)

10:00 AM - 10:15 AM

[14a-A28-5] Analysis of Target Erosion Profile in Rectangular Magnetron Sputtering Cathode by Three Dimensional Particle-in-Cell Monte Carlo Method

〇Yutaka Yabe¹, Kyosuke Kotera¹, Takefumi Yoshida¹, Shinichi Kubo¹, Osamu Takahashi¹, Kenichi Nanbu² (1.Showa Shinku Co., Ltd., 2.Institute of Fluid Science, Tohoku Univ.)

Break （10:15 AM - 10:30 AM）

10:30 AM - 10:45 AM

[14a-A28-6] Influence of Water Vapor Concentration on Fundamental Properties in Non-Equilibrium Atmospheric-Pressure Helium Plasmas

〇(M2)Junya Sakashita¹, Oda Akinori¹ (1.Chiba Inst. Technol.)

10:45 AM - 11:00 AM

△ [14a-A28-7] Numerical Analysis on the Mechanism of Dual-Grounded Tri-Electrode Plasma Actuator

〇(B)Asa Nakano¹, Hiroyuki Nishida¹, Tomomi Shiraishi¹ (1.TUAT)

11:00 AM - 11:15 AM

[14a-A28-8] PIC/MCC Analysis of a Micro ECR Plasma Thruster

〇(M1)Keisuke Ueno¹, Daisuke Mori¹, Yoshinori Takao¹, Koji Eriguchi¹, Kouichi Ono¹ (1.Kyoto Univ.)

11:15 AM - 11:30 AM

△ [14a-A28-9] Simulation of non-equilibrium high pressure neon plasma using by needle - plane electrode

〇Kazuki Motojima¹, Naoki Shirai¹, Satoshi Uchida¹, Fumiyoshi Tochikubo¹ (1.Tokyo Metro. Univ.)

11:30 AM - 11:45 AM

[14a-A28-10] Analysis of Heat Flux at Substrate for Control of Substrate Temperature during Plasma Processing

〇(DC)Takayoshi Tutumi¹, Yusuke Fukunaga¹, Kenji Ishikawa¹, Keigo Takeda¹, Hiroki Kondo¹, Takayuki Ohta², Masafumi Ito², Makoto Sekine¹, Masaru Hori¹ (1.Nagoya Univ., 2.Meijo Univ.)

Sessions

8 Plasma Electronics » 8.1 Plasma production and control

[12p-P9-1~5] 8.1 Plasma production and control

▲ [12p-P9-1] Plasma Production and Stability in Electron Cyclotron Resonance Source

[12p-P9-2] Generation mechanizm of radio frequency plasma in NaCl solution

[12p-P9-3] Simulation of Plasma Behavior in AP Microwave Line Plasma

[12p-P9-4] Duty Ratio Dependence of Treatment Performance in In-line Liquid Treatment Device Using Pulsed-Microwave Plasma

△ [12p-P9-5] The investigation of solution plasma reaction field in water-alcohol mixture: The influence of hydrogen-bond on gas/liquid interface

[13p-A28-1~10] 8.1 Plasma production and control

[13p-A28-1] ECR plasma sputtering apparatus partially substituting waveguides with coaxial cables

[13p-A28-2] Development of Photoresist Removal Process Using Microwave Excited Bubble Plasma in Water with Si Slot Antenna

[13p-A28-3] Improvement of electrodes for increasing various ion beam currents extracted from ECRIS

[13p-A28-4] Observing light emission from ECR multi-charged ion source plasma and considering its resonance phenomena

[13p-A28-5] Spatial Distribution of Electron Energy Distribution Function along to Field Lines on ECRIS

[13p-A28-6] Beam transport from the 1st to the 2nd stage and effect to the 1st stage plasma on the tandem type ECRIS by evaporation source installation

△ [13p-A28-7] Optimization of Cylindrical Cavity Excitation for Large-Area Microwave Plasma Generation II

△ [13p-A28-8] Efficient second-harmonic generation by microwave plasma with metamaterial effect (II)

[13p-A28-9] Production of Atmospheric Pressure Line Plasma by Microwave

[13p-A28-10] Effect of Applying AC Cathode Bias in RF Magnetron Sputtering

[14a-A28-1~10] 8.1 Plasma production and control

[14a-A28-1] Generation and Diagnostics of Atmospheric-pressure Non-equilibrium Plasma Generated Using Narrow-gap Electrode System

[14a-A28-2] RF plasma within a ceramic tube in pure water

△ [14a-A28-3] Investigation of chemical reaction in liquid induced by atmospheric glow discharge in contact with liquid

△ [14a-A28-4] Development of Electrical Discharge Model for High-pressure Gases and Supercritical Fluids Taking into Account Dependence of Density Fluctuation on Considered Volume

[14a-A28-5] Analysis of Target Erosion Profile in Rectangular Magnetron Sputtering Cathode by Three Dimensional Particle-in-Cell Monte Carlo Method

[14a-A28-6] Influence of Water Vapor Concentration on Fundamental Properties in Non-Equilibrium Atmospheric-Pressure Helium Plasmas

△ [14a-A28-7] Numerical Analysis on the Mechanism of Dual-Grounded Tri-Electrode Plasma Actuator

[14a-A28-8] PIC/MCC Analysis of a Micro ECR Plasma Thruster

△ [14a-A28-9] Simulation of non-equilibrium high pressure neon plasma using by needle - plane electrode

[14a-A28-10] Analysis of Heat Flux at Substrate for Control of Substrate Temperature during Plasma Processing

Authentication