[13p-A28-1~10] 8.1 Plasma production and control

[13p-A28-2] Development of Photoresist Removal Process Using Microwave Excited Bubble Plasma in Water with Si Slot Antenna

〇Takuya Itou¹, Ishijima Tatsuo¹, Tanaka Yasunori¹, Uesugi Yoshihiko¹, Nishiyama Takashi², Horibe Hideo² (1.Kanazawa Univ., 2.Osaka city Univ.)

Keywords:plasma,semiconductor,ashing